Organosilane Downstream Plasma On Ultra Low-k Dielectrics: Comparing Repair With Post Etch Treatment: Organosilane Downstream Plasma On Ultra Low-k Dielectrics:Comparing Repair Wit...

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Bibliographic Details

Authors and Corporations:	Calvo, Jesús, Steinke, Philipp, Wislicenus, Marcus, Gerlich, Lukas, Seidel, Robert, Clauss, Ellen, Uhlig, Benjamin
Title:	Organosilane Downstream Plasma On Ultra Low-k Dielectrics: Comparing Repair With Post Etch Treatment: Organosilane Downstream Plasma On Ultra Low-k Dielectrics:Comparing Repair With Post Etch Treatment
Type of Resource:	E-Book
Language:	English
published:	Chemnitz Technische Universität Chemnitz Online-Ausg.. 2016
Series:	Organosilane Downstream Plasma On Ultra Low-k Dielectrics: Comparing Repair With Post Etch Treatment; AMC 2015 – Advanced Metallization Conference
Subjects:	Plasma Low-K Dielectrics Repair Etch Konferenzschrift
Source:	Qucosa