Further processing options
online resource

Organosilane Downstream Plasma On Ultra Low-k Dielectrics: Comparing Repair With Post Etch Treatment: Organosilane Downstream Plasma On Ultra Low-k Dielectrics:Comparing Repair Wit...

Bibliographic Details
Authors and Corporations: Calvo, Jesús, Steinke, Philipp, Wislicenus, Marcus, Gerlich, Lukas, Seidel, Robert, Clauss, Ellen, Uhlig, Benjamin
Title: Organosilane Downstream Plasma On Ultra Low-k Dielectrics: Comparing Repair With Post Etch Treatment: Organosilane Downstream Plasma On Ultra Low-k Dielectrics:Comparing Repair With Post Etch Treatment (AMC 2015 – Advanced Metallization Conference)
Type of Resource: E-Article
Language: English
published:
Chemnitz Universitätsbibliothek Chemnitz 2016
Series: AMC 2015 – Advanced Metallization Conference
Subjects:
Source: Qucosa